LASER-DRIVEN MICROPLASMA XUV SOURCE

LASER-DRIVEN MICROPLASMA XUV SOURCE

Systems and methods for generating extreme ultraviolet radiation from plasma are described herein. In an embodiment, gas is provided to a gas target within a vacuum chamber. A pulse laser or a pulse laser-driven wavelength conversion system provides a beam which is focused through a lens or microsco...

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Hauptverfasser: Man, Michael K.L, Madeo, Julien Dominique Georges, Dani, Keshav M
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Sprache:eng
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creator Man, Michael K.L
Madeo, Julien Dominique Georges
Dani, Keshav M
description Systems and methods for generating extreme ultraviolet radiation from plasma are described herein. In an embodiment, gas is provided to a gas target within a vacuum chamber. A pulse laser or a pulse laser-driven wavelength conversion system provides a beam which is focused through a lens or microscope object onto the gas target to produce plasma. A collection mirror is then used to guide an extreme ultraviolet radiation beam from the plasma to a target location.
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In an embodiment, gas is provided to a gas target within a vacuum chamber. A pulse laser or a pulse laser-driven wavelength conversion system provides a beam which is focused through a lens or microscope object onto the gas target to produce plasma. A collection mirror is then used to guide an extreme ultraviolet radiation beam from the plasma to a target location.</description><language>eng</language><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHYSICS ; X-RAY TECHNIQUE</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201022&amp;DB=EPODOC&amp;CC=US&amp;NR=2020333559A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201022&amp;DB=EPODOC&amp;CC=US&amp;NR=2020333559A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Man, Michael K.L</creatorcontrib><creatorcontrib>Madeo, Julien Dominique Georges</creatorcontrib><creatorcontrib>Dani, Keshav M</creatorcontrib><title>LASER-DRIVEN MICROPLASMA XUV SOURCE</title><description>Systems and methods for generating extreme ultraviolet radiation from plasma are described herein. 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In an embodiment, gas is provided to a gas target within a vacuum chamber. A pulse laser or a pulse laser-driven wavelength conversion system provides a beam which is focused through a lens or microscope object onto the gas target to produce plasma. A collection mirror is then used to guide an extreme ultraviolet radiation beam from the plasma to a target location.</abstract><oa>free_for_read</oa></addata></record>
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subjects ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
X-RAY TECHNIQUE
title LASER-DRIVEN MICROPLASMA XUV SOURCE
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