LASER-DRIVEN MICROPLASMA XUV SOURCE

LASER-DRIVEN MICROPLASMA XUV SOURCE

Systems and methods for generating extreme ultraviolet radiation from plasma are described herein. In an embodiment, gas is provided to a gas target within a vacuum chamber. A pulse laser or a pulse laser-driven wavelength conversion system provides a beam which is focused through a lens or microsco...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Man, Michael K.L, Madeo, Julien Dominique Georges, Dani, Keshav M
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:Systems and methods for generating extreme ultraviolet radiation from plasma are described herein. In an embodiment, gas is provided to a gas target within a vacuum chamber. A pulse laser or a pulse laser-driven wavelength conversion system provides a beam which is focused through a lens or microscope object onto the gas target to produce plasma. A collection mirror is then used to guide an extreme ultraviolet radiation beam from the plasma to a target location.