THIN FILM FOR OPTICAL ELEMENT, METHOD OF MANUFACTURING THIN FILM FOR OPTICAL ELEMENT, INORGANIC POLARIZING PLATE, METHOD OF MANUFACTURING INORGANIC POLARIZING PLATE, OPTICAL ELEMENT, AND OPTICAL DEVICE

Provided are a thin film for optical element as a single-layer thin film which contains a Si simple substance, a Si compound excluding Si alloy, and a metal or metal compound, a method of manufacturing the thin film for optical element, and an optical element including the thin film for optical elem...

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Bibliographische Detailangaben
Hauptverfasser: Sugawara, Toshiaki, Takada, Akio
Format: Patent
Sprache:eng
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Zusammenfassung:Provided are a thin film for optical element as a single-layer thin film which contains a Si simple substance, a Si compound excluding Si alloy, and a metal or metal compound, a method of manufacturing the thin film for optical element, and an optical element including the thin film for optical element. Further provided are an inorganic polarizing plate including a reflection suppressing layer composed of the thin film for optical element, a method of manufacturing the inorganic polarizing plate, and an optical device including the inorganic polarizing plate.