PHOTOCURABLE COMPOSITION
Provided is a photocurable composition includinga component (A) which is an acrylic ester compound containing one or more acryloyl groups in one molecule;a component (B) which is an acrylic ester compound containing one or more acryloyl groups and one or more epoxy groups in one molecule;a component...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Provided is a photocurable composition includinga component (A) which is an acrylic ester compound containing one or more acryloyl groups in one molecule;a component (B) which is an acrylic ester compound containing one or more acryloyl groups and one or more epoxy groups in one molecule;a component (C) which is a compound containing two or more thiol groups in one molecule;a component (D) which is a photoradical generator; anda component (E) which is a photobase generator,in which a ratio between a total mass of the component (A) and the component (B) and a mass of the component (C) is in a range of 67.8 : 32.2 to 88.0 : 12.0, inclusive. |
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