METHOD AND APPARATUS FOR MANUFACTURING VAPOR DEPOSITION MASK

A material of the vapor deposition mask that a resin film layer is disposed on a surface of a metal film layer on which one or more openings are formed is welded on a metal frame in a manner so that the resin film layer faces outward under a condition that a predetermined tension is applied in a pre...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: SAKIO, SUSUMU
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator SAKIO, SUSUMU
description A material of the vapor deposition mask that a resin film layer is disposed on a surface of a metal film layer on which one or more openings are formed is welded on a metal frame in a manner so that the resin film layer faces outward under a condition that a predetermined tension is applied in a predetermined direction; the metal frame is held on a base mount; a taper forming member/material having a reflection surface or the like is disposed to facing the metal film layer which is inward of the metal frame; laser beams are irradiated from above the resin film layer.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2020303179A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2020303179A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2020303179A13</originalsourceid><addsrcrecordid>eNrjZLDxdQ3x8HdRcPQD4oAAxyDHkNBgBTf_IAVfR79QN0fnkNAgTz93hTDHAKCYi2uAf7BniKe_H1A62JuHgTUtMac4lRdKczMou7mGOHvophbkx6cWFyQmp-allsSHBhsZGBkYGxgbmls6GhoTpwoAuhUqnw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD AND APPARATUS FOR MANUFACTURING VAPOR DEPOSITION MASK</title><source>esp@cenet</source><creator>SAKIO, SUSUMU</creator><creatorcontrib>SAKIO, SUSUMU</creatorcontrib><description>A material of the vapor deposition mask that a resin film layer is disposed on a surface of a metal film layer on which one or more openings are formed is welded on a metal frame in a manner so that the resin film layer faces outward under a condition that a predetermined tension is applied in a predetermined direction; the metal frame is held on a base mount; a taper forming member/material having a reflection surface or the like is disposed to facing the metal film layer which is inward of the metal frame; laser beams are irradiated from above the resin film layer.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200924&amp;DB=EPODOC&amp;CC=US&amp;NR=2020303179A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200924&amp;DB=EPODOC&amp;CC=US&amp;NR=2020303179A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SAKIO, SUSUMU</creatorcontrib><title>METHOD AND APPARATUS FOR MANUFACTURING VAPOR DEPOSITION MASK</title><description>A material of the vapor deposition mask that a resin film layer is disposed on a surface of a metal film layer on which one or more openings are formed is welded on a metal frame in a manner so that the resin film layer faces outward under a condition that a predetermined tension is applied in a predetermined direction; the metal frame is held on a base mount; a taper forming member/material having a reflection surface or the like is disposed to facing the metal film layer which is inward of the metal frame; laser beams are irradiated from above the resin film layer.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLDxdQ3x8HdRcPQD4oAAxyDHkNBgBTf_IAVfR79QN0fnkNAgTz93hTDHAKCYi2uAf7BniKe_H1A62JuHgTUtMac4lRdKczMou7mGOHvophbkx6cWFyQmp-allsSHBhsZGBkYGxgbmls6GhoTpwoAuhUqnw</recordid><startdate>20200924</startdate><enddate>20200924</enddate><creator>SAKIO, SUSUMU</creator><scope>EVB</scope></search><sort><creationdate>20200924</creationdate><title>METHOD AND APPARATUS FOR MANUFACTURING VAPOR DEPOSITION MASK</title><author>SAKIO, SUSUMU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2020303179A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SAKIO, SUSUMU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SAKIO, SUSUMU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD AND APPARATUS FOR MANUFACTURING VAPOR DEPOSITION MASK</title><date>2020-09-24</date><risdate>2020</risdate><abstract>A material of the vapor deposition mask that a resin film layer is disposed on a surface of a metal film layer on which one or more openings are formed is welded on a metal frame in a manner so that the resin film layer faces outward under a condition that a predetermined tension is applied in a predetermined direction; the metal frame is held on a base mount; a taper forming member/material having a reflection surface or the like is disposed to facing the metal film layer which is inward of the metal frame; laser beams are irradiated from above the resin film layer.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US2020303179A1
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title METHOD AND APPARATUS FOR MANUFACTURING VAPOR DEPOSITION MASK
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-05T04%3A41%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SAKIO,%20SUSUMU&rft.date=2020-09-24&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2020303179A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true