METHOD AND APPARATUS FOR MANUFACTURING VAPOR DEPOSITION MASK

A material of the vapor deposition mask that a resin film layer is disposed on a surface of a metal film layer on which one or more openings are formed is welded on a metal frame in a manner so that the resin film layer faces outward under a condition that a predetermined tension is applied in a pre...

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Bibliographische Detailangaben
1. Verfasser:	SAKIO, SUSUMU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A material of the vapor deposition mask that a resin film layer is disposed on a surface of a metal film layer on which one or more openings are formed is welded on a metal frame in a manner so that the resin film layer faces outward under a condition that a predetermined tension is applied in a predetermined direction; the metal frame is held on a base mount; a taper forming member/material having a reflection surface or the like is disposed to facing the metal film layer which is inward of the metal frame; laser beams are irradiated from above the resin film layer.