Defect Inspection Method and Defect Inspection Device

The purpose of the present invention is to provide a defect inspection device that can evaluate a defect having a long latent flaw with high precision. A defect inspection device of the present invention is characterized by being provided with: a sample support member that supports a sample irradiated by an electron beam emitted from an electron source; an imaging element at which an image of electrons (mirror electrons) reflected without reaching the sample is formed via a retarding electric field formed on the sample; an ultraviolet light source that emits an ultraviolet light toward the sample; a movement stage that moves the sample support member; and a control device that controls the movement stage. The defect inspection device is further characterized in that the control device controls the movement stage such that a portion of a linear part included in an image of the sample (or a location on an extensional line of the linear part) is positioned at a specific location in an irradiated region of the electron beam, and repeats the control of the movement stage until an end of the linear part is positioned within the irradiated region of the electron beam.