SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME

The present disclosure provides a semiconductor structure and a method for manufacturing a semiconductor structure. The semiconductor structure includes a substrate, a transistor on the substrate, and an isolation structure. The transistor includes an epitaxial region on the substrate, having a firs...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: PAN, KUAN-TING, LIN, ZHIANG, CHIANG, KUONG, JU, SHI NING, CHENG, KUAN-LUN, WANG, CHIH-HAO
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:The present disclosure provides a semiconductor structure and a method for manufacturing a semiconductor structure. The semiconductor structure includes a substrate, a transistor on the substrate, and an isolation structure. The transistor includes an epitaxial region on the substrate, having a first side boundary and a second side boundary opposite to the first side boundary, wherein the first side boundary of the epitaxial region is conformal to a sidewall of the isolation structure.