LASER ETCHING APPARATUS AND LASER ETCHING METHOD USING THE SAME

A laser etching apparatus includes a light source to emit a first laser beam having a first energy profile; and a scanner to radiate a second laser beam upon an object along a circular path, the second laser beam having a second energy profile different from the first energy profile.

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Bae, Yoongyeong, Han, Gyoowan, Oh, Taekil, AHN, Jooseob, Ko, Yeonghwan
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A laser etching apparatus includes a light source to emit a first laser beam having a first energy profile; and a scanner to radiate a second laser beam upon an object along a circular path, the second laser beam having a second energy profile different from the first energy profile.