LASER ETCHING APPARATUS AND LASER ETCHING METHOD USING THE SAME
A laser etching apparatus includes a light source to emit a first laser beam having a first energy profile; and a scanner to radiate a second laser beam upon an object along a circular path, the second laser beam having a second energy profile different from the first energy profile.
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A laser etching apparatus includes a light source to emit a first laser beam having a first energy profile; and a scanner to radiate a second laser beam upon an object along a circular path, the second laser beam having a second energy profile different from the first energy profile. |
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