PLAITED LOW-MELT YARN FOR ADHERING FABRIC
Embodiments of the disclosure provide systems and methods for producing and using a plaited fabric comprising a low-melt yarn for adhering the fabric without a glue adhesive. According to one embodiment, a knitted fabric can comprise a first polymeric yarn of a first material, the first polymeric ya...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Embodiments of the disclosure provide systems and methods for producing and using a plaited fabric comprising a low-melt yarn for adhering the fabric without a glue adhesive. According to one embodiment, a knitted fabric can comprise a first polymeric yarn of a first material, the first polymeric yarn forming a base of the knitted fabric, and a second polymeric yarn of a second material. The second material can be different from the first material and can have a lower melting temperature than the first material. The first polymeric yarn can be knitted with the second polymeric yarn to form the fabric. Upon an application of heat to the knitted fabric, the second polymeric yarn can form an adhesive and cohesive mechanical attachment to itself and form a tight-knit structural bond within the fabric without the use of a glue adhesive. |
---|