ELECTROPLATING APPARATUS AND ELECTROPLATING METHOD USING THE SAME

An electroplating apparatus includes a plating bath and a substrate in a horizontal direction. The electroplating apparatus further includes a plurality of cathodes on first and second sides of the substrate in a first direction on one surface of the substrate, and an anode above the substrate, the...

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Bibliographische Detailangaben
Hauptverfasser: Kim, WooChan, Choi, Changjun, Kim, Gotae, Kim, Wook, Moon, SangCheol
Format: Patent
Sprache:eng
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