METHOD OF MEASURING A PARAMETER OF A PATTERNING PROCESS, METROLOGY APPARATUS, TARGET

A technique of measuring a parameter of a patterning process is disclosed. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning proces...

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Bibliographische Detailangaben
Hauptverfasser: SCHREEL, Koenraad Remi Andre Maria, CHENG, Su-Ting, EURLINGS, Markus Franciscus Antonius, KOOLEN, Armand Eugene Albert, TARABRIN, Sergey, SOKOLOV, Sergei
Format: Patent
Sprache:eng
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Zusammenfassung:A technique of measuring a parameter of a patterning process is disclosed. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.