DISSOLVED OZONE REMOVAL UNIT, SUBSTRATE TREATING APPARATUS INCLUDING THE SAME, AND SUBSTRATE TREATING METHOD

The inventive concept relates to a dissolved ozone removal unit, a substrate treating apparatus including the same, and a substrate treating method. The dissolved ozone removal unit includes a fluid channel providing member having a fluid channel through which a processing liquid passes and a light...

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Bibliographische Detailangaben
1. Verfasser:	CHOI, Moon Soon
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	The inventive concept relates to a dissolved ozone removal unit, a substrate treating apparatus including the same, and a substrate treating method. The dissolved ozone removal unit includes a fluid channel providing member having a fluid channel through which a processing liquid passes and a light source member that is mounted in the fluid channel providing member and that supplies UV light to the processing liquid, and the fluid channel providing member includes a helical fluid channel configured such that the processing liquid is exposed to the UV light while helically moving around the light source member.