METHOD FOR OPERATING AN OPTICAL APPARATUS, AND OPTICAL APPARATUS

A method for operating an optical apparatus (100A, 100B, 200), having a structural element (201) which is arranged in a residual gas atmosphere (RGA) of the apparatus and which is formed at least partly from an element material subjected to a chemical reduction process and/or an etching process with...

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Bibliographische Detailangaben
Hauptverfasser:	SCHMIDT, Stefan-Wolfgang, BECKER, Moritz
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	A method for operating an optical apparatus (100A, 100B, 200), having a structural element (201) which is arranged in a residual gas atmosphere (RGA) of the apparatus and which is formed at least partly from an element material subjected to a chemical reduction process and/or an etching process with a plasma component (PK) present in the residual gas atmosphere includes: feeding (S2) a gas component (GK) that at least partly suppresses the reduction process depending on a detected suppression extent (UM) for a suppression of the etching process and/or reduction process by the suppressing gas component in the residual gas atmosphere; and detecting (S1) the suppression extent with a sensor unit (208) arranged in the residual gas atmosphere. The sensor unit includes a sensor material section (211) composed of a sensor material and exhibiting a sensor section property that is measurable under the influence of the suppressing gas component.