SUBSTRATE INSPECTION APPARATUS, METHOD OF CALIBRATING THE SUBSTRATE INSPECTION APPARATUS, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

A substrate inspection apparatus includes a light irradiating unit irradiating first light to an inspection target on a stage, a light detecting unit detecting second light reflected by the inspection target, a spectrum generator generating a first spectrum from the second light, a noise filter modu...

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Bibliographische Detailangaben
Hauptverfasser:	YANG, Yu Sin, BAE, Yoon Sung, PARK, Jang Ik, SOHN, Young Hoon, JO, Tae Yong, KIM, Kwang Rak
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	A substrate inspection apparatus includes a light irradiating unit irradiating first light to an inspection target on a stage, a light detecting unit detecting second light reflected by the inspection target, a spectrum generator generating a first spectrum from the second light, a noise filter module removing a noise signal from the first spectrum to generate a second spectrum, a spectrum analyzer determining a first calibration parameter and a first calibration value thereof from the second spectrum, and a hardware controller adjusting at least one of the stage, the light irradiating unit and the light detecting unit using the first calibration parameter and the first calibration value.