SOLUTION FOR PROCESSING MACHINES

A solution for processing machines includes a lubricating base including polyalkylene glycol, a fluorine-based surfactant or a cationic surfactant, and water. The lubricating base includes at least one of a polyoxyethylene/polyoxypropylene reverse block, an ethylenediamine polyoxyalkylene condensate...

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Bibliographische Detailangaben
Hauptverfasser:	TAKEUCHI, Taro, IENAGA, Hirofumi, INAGAKI, Hidekazu
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMISTRY FUELS LUBRICANTS LUBRICATING COMPOSITIONS METALLURGY PEAT PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MONOXIDE USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATINGINGREDIENTS IN A LUBRICATING COMPOSITION
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Beschreibung
Zusammenfassung:	A solution for processing machines includes a lubricating base including polyalkylene glycol, a fluorine-based surfactant or a cationic surfactant, and water. The lubricating base includes at least one of a polyoxyethylene/polyoxypropylene reverse block, an ethylenediamine polyoxyalkylene condensate, polyoxyethylene polyoxypropylene glycol, and an ethylene oxide propylene oxide polymer, as polyalkylene glycol.