Setpoint Generator, Lithographic Apparatus, Lithographic Apparatus Operating Method, and Device Manufacturing Method
The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number...
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| creator | VAN DAMME, Jean-Philippe Xavier VAN BOKHOVEN, Laurentius Johannes Adrianus VAN GILS, Petrus Franciscus PIETERSE, Gerben |
| description | The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2020174381A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2020174381A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2020174381A13</originalsourceid><addsrcrecordid>eNrjZCgJTi0pyM_MK1FwT81LLUosyS_SUfDJLMnITy9KLMjITFZwLChIBIqXFuMSV_AvAGnMzEtX8E0FKkjRUUjMS1FwSS3LTE5V8E3MK01LTC4pLUIo4GFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFiclAt5TEhwYbGRgZGJqbGFsYOhoaE6cKAIiYRYg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Setpoint Generator, Lithographic Apparatus, Lithographic Apparatus Operating Method, and Device Manufacturing Method</title><source>esp@cenet</source><creator>VAN DAMME, Jean-Philippe Xavier ; VAN BOKHOVEN, Laurentius Johannes Adrianus ; VAN GILS, Petrus Franciscus ; PIETERSE, Gerben</creator><creatorcontrib>VAN DAMME, Jean-Philippe Xavier ; VAN BOKHOVEN, Laurentius Johannes Adrianus ; VAN GILS, Petrus Franciscus ; PIETERSE, Gerben</creatorcontrib><description>The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200604&DB=EPODOC&CC=US&NR=2020174381A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200604&DB=EPODOC&CC=US&NR=2020174381A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VAN DAMME, Jean-Philippe Xavier</creatorcontrib><creatorcontrib>VAN BOKHOVEN, Laurentius Johannes Adrianus</creatorcontrib><creatorcontrib>VAN GILS, Petrus Franciscus</creatorcontrib><creatorcontrib>PIETERSE, Gerben</creatorcontrib><title>Setpoint Generator, Lithographic Apparatus, Lithographic Apparatus Operating Method, and Device Manufacturing Method</title><description>The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZCgJTi0pyM_MK1FwT81LLUosyS_SUfDJLMnITy9KLMjITFZwLChIBIqXFuMSV_AvAGnMzEtX8E0FKkjRUUjMS1FwSS3LTE5V8E3MK01LTC4pLUIo4GFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFiclAt5TEhwYbGRgZGJqbGFsYOhoaE6cKAIiYRYg</recordid><startdate>20200604</startdate><enddate>20200604</enddate><creator>VAN DAMME, Jean-Philippe Xavier</creator><creator>VAN BOKHOVEN, Laurentius Johannes Adrianus</creator><creator>VAN GILS, Petrus Franciscus</creator><creator>PIETERSE, Gerben</creator><scope>EVB</scope></search><sort><creationdate>20200604</creationdate><title>Setpoint Generator, Lithographic Apparatus, Lithographic Apparatus Operating Method, and Device Manufacturing Method</title><author>VAN DAMME, Jean-Philippe Xavier ; VAN BOKHOVEN, Laurentius Johannes Adrianus ; VAN GILS, Petrus Franciscus ; PIETERSE, Gerben</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2020174381A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2020</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>VAN DAMME, Jean-Philippe Xavier</creatorcontrib><creatorcontrib>VAN BOKHOVEN, Laurentius Johannes Adrianus</creatorcontrib><creatorcontrib>VAN GILS, Petrus Franciscus</creatorcontrib><creatorcontrib>PIETERSE, Gerben</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VAN DAMME, Jean-Philippe Xavier</au><au>VAN BOKHOVEN, Laurentius Johannes Adrianus</au><au>VAN GILS, Petrus Franciscus</au><au>PIETERSE, Gerben</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Setpoint Generator, Lithographic Apparatus, Lithographic Apparatus Operating Method, and Device Manufacturing Method</title><date>2020-06-04</date><risdate>2020</risdate><abstract>The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Setpoint Generator, Lithographic Apparatus, Lithographic Apparatus Operating Method, and Device Manufacturing Method |
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