Setpoint Generator, Lithographic Apparatus, Lithographic Apparatus Operating Method, and Device Manufacturing Method

The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: VAN DAMME, Jean-Philippe Xavier, VAN BOKHOVEN, Laurentius Johannes Adrianus, VAN GILS, Petrus Franciscus, PIETERSE, Gerben
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.