METHOD OF CLEANING SEMICONDUCTOR EQUIPMENT AND SEMICONDUCTOR EQUIPMENT MANAGEMENT SYSTEM

A method of cleaning semiconductor equipment includes monitoring a state of a fluid in a pipeline of the semiconductor equipment, constructing a database by using data collected through the monitoring, diagnosing a state of the pipeline based on the data collected through the monitoring and stored i...

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Bibliographische Detailangaben
Hauptverfasser:	Oh, Yun-Sek, Park, Won-Ki, Park, Su-Man, Jang, Young-Il, Oh, Kyoung-Whan, Lee, Ho-Youl
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CALCULATING CLEANING CLEANING IN GENERAL COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS COMPUTING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL METERING BY VOLUME PERFORMING OPERATIONS PHYSICS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TESTING TRANSPORTING
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Beschreibung
Zusammenfassung:	A method of cleaning semiconductor equipment includes monitoring a state of a fluid in a pipeline of the semiconductor equipment, constructing a database by using data collected through the monitoring, diagnosing a state of the pipeline based on the data collected through the monitoring and stored in the database, and cleaning the pipeline by using an ultrasound wave when the state of the pipeline is diagnosed as being abnormal. The pipeline is cleaned by using at least two ultrasound wave generators.