APPARATUS AND METHOD FOR ALIGNING INTEGRATED CIRCUIT LAYERS USING MULTIPLE GRATING MATERIALS

APPARATUS AND METHOD FOR ALIGNING INTEGRATED CIRCUIT LAYERS USING MULTIPLE GRATING MATERIALS

Embodiments of the disclosure provides an apparatus for aligning layers of an integrated circuit (IC), the apparatus including: an insulator layer positioned above a semiconductor substrate; a first diffraction grating within a first region of the insulator layer, the first diffraction grating inclu...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Tabakman, Keith H, Hao, Xueli, Dai, Xintuo, He, Guanchen, Yang, Dongyue
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:Embodiments of the disclosure provides an apparatus for aligning layers of an integrated circuit (IC), the apparatus including: an insulator layer positioned above a semiconductor substrate; a first diffraction grating within a first region of the insulator layer, the first diffraction grating including a first grating material within the first region of the insulator layer; and a second diffraction grating within a second region of the insulator layer, the second grating including a second grating material within the second region of the insulator layer, wherein the second grating material is different from the first grating material, and wherein an optical contrast between the first and second grating materials is greater than an optical contrast between the second grating material and the insulator layer.