CLEANING METHOD AND PLASMA PROCESSING APPARATUS

In a cleaning method according to an exemplary embodiment, a plasma is formed from a cleaning gas in a chamber of a plasma processing apparatus. A focus ring is mounted on a substrate support in the chamber to extend around a central axis of the chamber. While the plasma is formed, a magnetic field...

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Bibliographische Detailangaben
Hauptverfasser:	IWANO, Mitsuhiro, HOSOYA, Masanori
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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Beschreibung
Zusammenfassung:	In a cleaning method according to an exemplary embodiment, a plasma is formed from a cleaning gas in a chamber of a plasma processing apparatus. A focus ring is mounted on a substrate support in the chamber to extend around a central axis of the chamber. While the plasma is formed, a magnetic field distribution is formed in the chamber by an electromagnet. The magnetic field distribution has a maximum horizontal component in a location on the focus ring or a location outside the focus ring in a radial direction with respect to the central axis.