POLYIMIDE FILM

A polyimide film having, when measured at a film thickness of 10 μm, a weight residue ratio of 99.0% or more when held at 400° C. for 4 hours, a YI (yellow index) of 10 or less, and a coefficient of linear thermal expansion between 100 and 350° C. of 55 ppm/K or less. The polyimide film is excellent...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	HISANO, Nobuharu, NAKAGAWA, Miharu, OKA, Takuya
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING GENERAL PROCESSES OF COMPOUNDING MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP
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Beschreibung
Zusammenfassung:	A polyimide film having, when measured at a film thickness of 10 μm, a weight residue ratio of 99.0% or more when held at 400° C. for 4 hours, a YI (yellow index) of 10 or less, and a coefficient of linear thermal expansion between 100 and 350° C. of 55 ppm/K or less. The polyimide film is excellent in transparency and heat resistance, has a low linear thermal expansion coefficient, and can be suitably used for a substrate for a display, a touch panel, or a solar cell.