CLEANING OF NANOSTRUCTURES

The present invention relates to a method for removing a polymeric material from a surface of a nanostructure. The method includes applying, by a scanning probe microscope, an electrical field between a probe tip of the scanning probe microscope and the nanostructure, and simultaneously scanning ove...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	Nirmalraj, Pio Peter Niraj
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMISTRY CLEANING CLEANING IN GENERAL COMPOUNDS THEREOF INORGANIC CHEMISTRY METALLURGY MICROSTRUCTURAL TECHNOLOGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS TRANSPORTING
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