CLEANING OF NANOSTRUCTURES

The present invention relates to a method for removing a polymeric material from a surface of a nanostructure. The method includes applying, by a scanning probe microscope, an electrical field between a probe tip of the scanning probe microscope and the nanostructure, and simultaneously scanning ove...

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Bibliographische Detailangaben
1. Verfasser:	Nirmalraj, Pio Peter Niraj
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMISTRY CLEANING CLEANING IN GENERAL COMPOUNDS THEREOF INORGANIC CHEMISTRY METALLURGY MICROSTRUCTURAL TECHNOLOGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention relates to a method for removing a polymeric material from a surface of a nanostructure. The method includes applying, by a scanning probe microscope, an electrical field between a probe tip of the scanning probe microscope and the nanostructure, and simultaneously scanning over the surface of the nanostructure. Thereby, bonds connecting the polymeric material to the surface of the nanostructure are broken. A further step includes cleaning the surface of the nanostructure. A scanning probe microscope for performing such a method and a computer program product for controlling the scanning probe microscope are also disclosed.