MANUFACTURING A COLLIMATOR ELEMENT

A method is disclosed for manufacturing a collimator element. The method includes applying a lithographic coating layer. The lithographic coating layer is then exposed using a grid mask. Exposure regions then correspond to a structure of the collimator element. Here, the structure of the collimator...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ERGLER, Thorsten, KRSTIC, Vojislav
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method is disclosed for manufacturing a collimator element. The method includes applying a lithographic coating layer. The lithographic coating layer is then exposed using a grid mask. Exposure regions then correspond to a structure of the collimator element. Here, the structure of the collimator element is aligned on a common focus. The lithographic coating layer is then developed to give a pre-structure of the collimator element. Further, an X-ray absorbing layer is applied via cathode sputtering. At least the X-ray absorbing layer is then removed from regions of the pre-structure. A collimator element, a method for manufacturing a scattered-radiation collimator, a scattered-radiation collimator, a radiation detector and a CT device are also disclosed.