SUBSTRATE TREATING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

According to one embodiment, a substrate treating method includes: providing a first liquid onto a pattern on a substrate; providing, after the first liquid is provided, a second liquid containing a first substance to form a film containing the first substance on the pattern; providing, after the se...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ITO, Fuyuma, YANAI, Naomi, YOSHIMIZU, Yasuhito
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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