VACUUM SYSTEM AND METHOD FOR DEPOSITING A PLURALITY OF MATERIALS ON A SUBSTRATE

A vacuum system for depositing a plurality of materials on a substrate is described. The vacuum system includes a plurality of deposition modules arranged along a main transport direction and including deposition sources which are movable in the main transport direction; and a transport system with...

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Bibliographische Detailangaben
1. Verfasser:	HEIMEL, Oliver
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A vacuum system for depositing a plurality of materials on a substrate is described. The vacuum system includes a plurality of deposition modules arranged along a main transport direction and including deposition sources which are movable in the main transport direction; and a transport system with a plurality of tracks extending in the main transport direction through the plurality of deposition modules and including a first mask track for mask transport, a first substrate track for substrate transport and a return track for returning empty carriers.