AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND METHOD OF PRODUCING THE SAME
An aqueous dispersion for chemical mechanical polishing includes: (A) silica particles; (B) at least one kind selected from the group consisting of organic acids and salts thereof; and (C) at least one kind selected from the group consisting of amino group-containing silane compounds and condensates...
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| creator | Okamoto, Masashi Kunitani, Eiichirou Hirai, Yuuji Nakanishi, Kouji |
| description | An aqueous dispersion for chemical mechanical polishing includes: (A) silica particles; (B) at least one kind selected from the group consisting of organic acids and salts thereof; and (C) at least one kind selected from the group consisting of amino group-containing silane compounds and condensates thereof, and has a pH of 7 or more and 14 or less. |
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| subjects | ADHESIVES CHEMISTRY DYES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES |
| title | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND METHOD OF PRODUCING THE SAME |
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