METHOD OF FORMING CONDUCTIVE POLYMER THIN FILM PATTERN

Disclosed is a method of forming a conductive polymer thin film pattern, including (a) Coating substrate with solution including PEDOT:PSS (poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate)) to form coating layer including solution on substrate, (b) irradiating a predetermined portion of the...

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Bibliographische Detailangaben
Hauptverfasser: GO, Hyeck, YUN, Changhun
Format: Patent
Sprache:eng
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Zusammenfassung:Disclosed is a method of forming a conductive polymer thin film pattern, including (a) Coating substrate with solution including PEDOT:PSS (poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate)) to form coating layer including solution on substrate, (b) irradiating a predetermined portion of the coating layer with light, thus manufacturing a pre-patterned substrate including PEDOT:PSS patterned on the predetermined portion and the coating layer other than the predetermined portion, and (c) removing the coating layer from the pre-patterned substrate, thus manufacturing a conductive polymer thin film having a PEDOT:PSS pattern. When the pattern formation method of the invention is applied, a pattern can be formed by directly irradiating a PEDOT:PSS solution with a laser, there is no need for additional drying, thus simplifying the processing and reducing the processing time, and a thin film for use in a transparent electrode can be manufactured, thereby improving the conductivity, transmittance, flatness and precision of the electrode.