CAMERA POSTURE ESTIMATION METHOD AND SUBSTRATE PROCESSING APPARATUS

A method for estimating a posture of a camera installed in a substrate processing apparatus to obliquely photograph an object includes removing the remaining background other than a substrate and performing ellipse fitting, adjusting a yaw direction of the camera by using a difference between the ce...

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Bibliographische Detailangaben
Hauptverfasser:	BAE, SUNG WOOK, KWON, OHYEOL, CHUN, SUNGYONG
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC COMMUNICATION TECHNIQUE ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PICTORIAL COMMUNICATION, e.g. TELEVISION SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A method for estimating a posture of a camera installed in a substrate processing apparatus to obliquely photograph an object includes removing the remaining background other than a substrate and performing ellipse fitting, adjusting a yaw direction of the camera by using a difference between the center of a camera image and the center of an elliptical substrate image obtained by performing the ellipse fitting, adjusting a roll direction of the camera by using a tilt angle of an ellipse in the elliptical substrate image obtained by performing the ellipse fitting, and adjusting a pitch direction of the camera by using a ratio of a minor axis to a major axis of the ellipse in the elliptical substrate image obtained by performing the ellipse fitting.