LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A lithographic apparatus is described, the apparatus comprising: a projection system (PS; 200) configured to project a patterned beam (B) of radiation onto a substrate (W); the projection system comprising a plurality of optical elements (200.1, 200.2); a sensor frame (220); a first position measure...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	WIJCKMANS, Maurice Willem Jozef Etiënne, VERVOORDELDONK, Michael Johannes, BUTLER, Hans
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A lithographic apparatus is described, the apparatus comprising: a projection system (PS; 200) configured to project a patterned beam (B) of radiation onto a substrate (W); the projection system comprising a plurality of optical elements (200.1, 200.2); a sensor frame (220); a first position measurement system (240) configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: - N sub-frames (220.1, 220.2), N being an integer > 1, - a coupling system (220.3) coupling the N sub-frames and - a second position measurement system (250) configured to determine a relative position of the N sub-frames.