METHOD FOR FORMING TRANSPARENT FLUORINE FILM, AND TRANSPARENT FLUORINE FILM FORMED THEREBY

One embodiment of the present invention relates to a method for forming a transparent fluorine film, and a transparent fluorine film formed thereby, and the technical issues to be resolved are to provide a method for forming a transparent fluorine film, and transparent fluorine film formed thereby t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: PARK, Jae Hyuk, KIM, Dae Gean, KIM, Byung Ki, SEOK, Hye Won, LEE, Myoung No
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:One embodiment of the present invention relates to a method for forming a transparent fluorine film, and a transparent fluorine film formed thereby, and the technical issues to be resolved are to provide a method for forming a transparent fluorine film, and transparent fluorine film formed thereby that can protect the transparent windows of display devices by having not only high transmissivity due to no or extremely small nano-structured pores in the interior, but also having high strength and adhesiveness. To that end, disclosed are a method for forming a transparent fluorine film, and a transparent fluorine film formed thereby, the method comprising the steps of: receiving transport gas from a transport gas supply unit and YF3 powder from a powder supply unit, and transporting the YF3 powder in aerosol form; and colliding and crushing the YF3 powder transported in aerosol form against a substrate in the interior of a processing chamber, and forming a transparent YF3 film on the substrate.