Gas-Pulsing-Based Shared Precursor Distribution System and Methods of Use

Gas-Pulsing-Based Shared Precursor Distribution System and Methods of Use

Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared...

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Bibliographische Detailangaben
Hauptverfasser: Brashear, Kevin M, AuBuchon, Joseph, Baluja, Sanjeev, Fernandez, Alexander, Xu, Ming, Josephson, Marcel E, Rice, Michael, Koshti, Sushant Suresh, Okada, Ashley M, Le, Kenneth
Format: Patent
Sprache:eng
Schlagworte:
CONTROLLING
PHYSICS
REGULATING
SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
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Beschreibung
Zusammenfassung:Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the gas distribution apparatus and calibrating the flow controllers are also described.