FORMATION OF TALL METAL PILLARS USING MULTIPLE PHOTORESIST LAYERS

FORMATION OF TALL METAL PILLARS USING MULTIPLE PHOTORESIST LAYERS

An apparatus system is provided which comprises: a substrate; a metal pillar formed on the substrate, the metal pillar comprising a first section and a second section, wherein the first section of the metal pillar is formed by depositing metal in a first opening of a first photoresist layer, and whe...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Cheng, Liwei, Chavali, Sri Chaitra J, Li, Sheng, Alur, Siddharth K
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:An apparatus system is provided which comprises: a substrate; a metal pillar formed on the substrate, the metal pillar comprising a first section and a second section, wherein the first section of the metal pillar is formed by depositing metal in a first opening of a first photoresist layer, and wherein the second section of the metal pillar is formed by depositing metal in a second opening of a second photoresist layer.