AEI TYPE ZEOLITE, METHOD FOR PRODUCING SAME, AND USES THEREOF

AEI TYPE ZEOLITE, METHOD FOR PRODUCING SAME, AND USES THEREOF

Provided is a method for producing an inexpensive, high-performance AEI type zeolite and an AEI type zeolite having a Si/Al ratio of 6.5 or less by using neither an expensive Y type zeolite as a raw material nor dangerous hydrofluoric acid. The method for producing an AEI type zeolite having a Si/Al...

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Bibliographische Detailangaben
Hauptverfasser: TANAKA, Manabu, Takewaki, Takahiko, Hara, Masahiro, Matsuo, Takeshi
Format: Patent
Sprache:eng
Schlagworte:
BLASTING
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
CHEMISTRY
COMPOUNDS THEREOF
ENGINE PLANTS IN GENERAL
GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNALCOMBUSTION ENGINES
GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES ORENGINES IN GENERAL
HEATING
INORGANIC CHEMISTRY
LIGHTING
MACHINES OR ENGINES IN GENERAL
MECHANICAL ENGINEERING
METALLURGY
NON-METALLIC ELEMENTS
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
STEAM ENGINES
THEIR RELEVANT APPARATUS
TRANSPORTING
WEAPONS
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Beschreibung
Zusammenfassung:Provided is a method for producing an inexpensive, high-performance AEI type zeolite and an AEI type zeolite having a Si/Al ratio of 6.5 or less by using neither an expensive Y type zeolite as a raw material nor dangerous hydrofluoric acid. The method for producing an AEI type zeolite having a Si/Al ratio of 50 or less includes: preparing a mixture including a silicon atom material, an aluminum atom material, an alkali metal atom material, an organic structure-directing agent, and water; and performing hydrothermal synthesis of the obtained mixture, in which a compound having a Si content of 20% by weight or less and containing aluminum is used as the aluminum atom material; and the mixture includes a zeolite having a framework density of 14 T/1000 Å3 or more in an amount of 0.1% by weight or more with respect to SiO2 assuming that all Si atoms in the mixture are formed in SiO2.