HIGH TEMPERATURE GAS DISTRIBUTION ASSEMBLY

The present disclosure generally relates to an apparatus for gas distribution in a substrate processing chamber. The gas distribution apparatus includes a first blocker plate, a second blocker plate, and a faceplate. The faceplate movably rests on a chamber liner partially defining a processing volu...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	BALUJA, Sanjeev
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present disclosure generally relates to an apparatus for gas distribution in a substrate processing chamber. The gas distribution apparatus includes a first blocker plate, a second blocker plate, and a faceplate. The faceplate movably rests on a chamber liner partially defining a processing volume. A lamp assembly is disposed above the gas distribution assembly and tunably heats the faceplate.