MEMORY DEVICE

According to one embodiment, a memory device includes a plurality of first electrode layers stacked over each other in a stacking direction, a pair of second electrode layers located over the plurality of first electrode layers in the stacking direction, a channel layer extending through the first and second electrode layers, and a charge storage layer between each first electrode layer and the channel layer. A thickness in the stacking direction of at least one of the second electrode layers being greater than a thickness in the stacking direction of any of the first electrode layers.