LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or ot...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	LOOPSTRA, Erik Roelof, HOOGENDAM, Christiaan Alexander, SIMON, Klaus, VAN SANTEN, Helmar, KOLESNYCHENKO, Aleksey Yurievich, BUTLER, Hans, STRAAIJER, Alexander, JANSEN, Hans, VAN SCHAIK, Frank, SENGERS, Timotheus Franciscus, RITSEMA, Roelof Aeilko Siebrand, BIJLAART, Erik Theodorus Maria, VERSPAY, Jacobus Johannus Leonardus Hendricus, STREEFKERK, Bob, MULKENS, Johannes Catharinus Hubertus, DERKSEN, Antonius Theodorus Anna Maria, MEIJER, Hendricus Johannes Maria, DE SMIT, Joannes Theodoor, LOF, Joeri, DONDERS, Sjoerd Nicolaas Lambertus, MERTENS, Jeroen Johannes Sophia Maria
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.