SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS, AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE USING THE APPARATUS

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS, AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE USING THE APPARATUS

Disclosed are a method for cleaning a substrate, an apparatus for cleaning a substrate, and a method for fabricating a semiconductor device using the same. The method may include cleaning a substrate in a wet process, providing a supercritical fluid onto the substrate to remove moisture from the sub...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHOI, Hoseop, KIM, Minhyoung, YOO, Beomjin, BANG, Jeongmin, HAN, KyuHee, JANG, Wonhyuk
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:Disclosed are a method for cleaning a substrate, an apparatus for cleaning a substrate, and a method for fabricating a semiconductor device using the same. The method may include cleaning a substrate in a wet process, providing a supercritical fluid onto the substrate to remove moisture from the substrate, and cleaning the substrate in a dry process to remove defect particles from a substrate, which are produced by the supercritical fluid.