GIMBAL FOR CMP TOOL CONDITIONING DISK HAVING FLEXIBLE METAL DIAPHRAGM

A gimbal for a conditioning system for a CMP tool is configured to maintain a conditioning disk in contact with a polishing pad of the CMP tool. The gimbal includes an arm coupling for coupling to a conditioning swing arm of the CMP tool; and a disk holder for holding the conditioning disk. A flexib...

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Bibliographische Detailangaben
Hauptverfasser:	Vincent Eddy, Aldrin Bernard Anak, Koli, Dinesh R, Jung, Sung Pyo, Bodensieck, Eric J, Lee, Sunghoon
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING SEMICONDUCTOR DEVICES TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING
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Beschreibung
Zusammenfassung:	A gimbal for a conditioning system for a CMP tool is configured to maintain a conditioning disk in contact with a polishing pad of the CMP tool. The gimbal includes an arm coupling for coupling to a conditioning swing arm of the CMP tool; and a disk holder for holding the conditioning disk. A flexible diaphragm extends between the arm coupling and the disk holder. The flexible diaphragm allows the disk holder to flex relative to the arm coupling. The flexible diaphragm is made of a metal or metal alloy.