PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND ELECTRONIC DEVICE

wherein, in Chemical Formula 1, each substituent is the same as defined in the specification.

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KIM, Ji Yoon, KIM, Sang Soo, KANG, Heekyoung, AN, Chiwon, HONG, Chungbeum, BAEK, Taek-Jin, KANG, Jinhee, LEE, Bumjin
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	wherein, in Chemical Formula 1, each substituent is the same as defined in the specification.