COMPOSITE STRUCTURE, SEMICONDUCTOR MANUFACTURING APPARATUS AND DISPLAY MANUFACTURING APPARATUS PROVIDED WITH COMPOSITE STRUCTURE

Disclosed is provision of a ceramic coat having an excellent low-particle generation as well as a method for assessing the low-particle generation of the ceramic coat. A composite structure including a substrate and a structure which is formed on the substrate and has a surface, wherein the structur...

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Bibliographische Detailangaben
Hauptverfasser: TAKAHASHI, Yuuki, IWASAWA, Junichi, KINJO, Atsushi, AOSHIMA, Toshihiro, WADA, Takuma, ASHIZAWA, Hiroaki, TAKIZAWA, Ryoto
Format: Patent
Sprache:eng
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Zusammenfassung:Disclosed is provision of a ceramic coat having an excellent low-particle generation as well as a method for assessing the low-particle generation of the ceramic coat. A composite structure including a substrate and a structure which is formed on the substrate and has a surface, wherein the structure includes a polycrystalline ceramic and the composite structure has luminance Sa satisfying a specific value calculated from a TEM image analysis thereof, can be suitably used as an inner member of a semiconductor manufacturing apparatus required to have a low-particle generation.