SEMICONDUCTOR DEVICE AND A METHOD OF FORMING THE SEMICONDUCTOR DEVICE

According to various embodiments, a device may include: a semiconductor region; a metallization layer disposed over the semiconductor region; and a self-organizing barrier layer disposed between the metallization layer and the semiconductor region, wherein the self-organizing barrier layer comprises...

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Bibliographische Detailangaben
Hauptverfasser: Robl, Werner, Fugger, Michael, Schaeffer, Carsten, Pruegl, Klemens, Nelhiebel, Michael
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:According to various embodiments, a device may include: a semiconductor region; a metallization layer disposed over the semiconductor region; and a self-organizing barrier layer disposed between the metallization layer and the semiconductor region, wherein the self-organizing barrier layer comprises a first metal configured to be self-segregating from the metallization layer.