METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPARATUS

Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiat...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VAN BOXMEER, Johan Maria, TSIATMAS, Anagnostis, SHANG, Xiaoxin, VERSTRAETEN, Bert, FAGGINGER AUER, Bastiaan Onne, MEDVEDYEVA, Mariya Vyacheslavivna, CRAMER, Hugo Augustinus Joseph, VAN WEERT, Martinus Hubertus Maria
Format:	Patent
Sprache:	eng
Schlagworte:	MEASURING PHYSICS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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