METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPARATUS

Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiat...

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Bibliographische Detailangaben
Hauptverfasser:	VAN BOXMEER, Johan Maria, TSIATMAS, Anagnostis, SHANG, Xiaoxin, VERSTRAETEN, Bert, FAGGINGER AUER, Bastiaan Onne, MEDVEDYEVA, Mariya Vyacheslavivna, CRAMER, Hugo Augustinus Joseph, VAN WEERT, Martinus Hubertus Maria
Format:	Patent
Sprache:	eng
Schlagworte:	MEASURING PHYSICS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiation redirected by the target. The applications of the metrology process include applications at different nominal focus heights. The measurement data includes, for each application of the metrology process, at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal focus height for the metrology process using the obtained measurement data.