LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A HEATER

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

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Bibliographische Detailangaben
Hauptverfasser:	TEN KATE, Nicolaas, VAN DER NET, Antonius Johannus, JANSSEN, Franciscus Johannes Joseph, DE JONG, Frederik Eduard, SMEETS, Martin Frans Pierre, RIEPEN, Michel, TINNEMANS, Patricius Aloysius Jacobus, VERHAGEN, Martinus Cornelis Maria, OTTENS, Joost Jeroen, MOERMAN, Richard, BOOM, Herman, REUHMAN-HUISKEN, Maria Elisabeth, VERSPAY, Jacobus Johannus Leonardus Hendricus, STAVENGA, Marco Koert, LOOPSTRA, Erik Roelof, GOORMAN, Koen, QUAEDACKERS, Johannes Anna, DE MOL, Christianus Gerardus Maria, MENCHTCHIKOV, Boris, NIHTIANOV, Stoyan, SCHOONDERMARK, Bart Leonard Peter, JACOBS, Johannes Henricus Wilhelmus, VAN MEER, Aschwin Lodewijk Hendricus Johannes, MUITJENS, Marcel Johannus Elisabeth Hubertus, MERTENS, Jeroen Johannes Sophia Maria, CADEE, Theodorus Petrus Maria
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.