MICROEMULSION REMOVERS FOR ADVANCED PHOTOLITHOGRAPHY

The present invention provides a microemulsion remover comprising, based on the total weight of the microemulsion remover, 1) from 10% to 60%, at least one organic solvent, ii) from 10% to 50%, at least one co-solvent, iii) from 0.1% to 10%, at least one base, iv) from 0.1% to 10%, at least one oxid...

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Bibliographische Detailangaben
Hauptverfasser: Lu, Zhijian, Yamada, Shintaro, Schmitt, Adam K, Mohler, Carol E, Tucker, Christopher J, O'Connell, Kathleen M
Format: Patent
Sprache:eng
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Zusammenfassung:The present invention provides a microemulsion remover comprising, based on the total weight of the microemulsion remover, 1) from 10% to 60%, at least one organic solvent, ii) from 10% to 50%, at least one co-solvent, iii) from 0.1% to 10%, at least one base, iv) from 0.1% to 10%, at least one oxidizer, v) from 0.1% to 10%, at least one surfactant, and vi) water.