ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE

An actinic ray-sensitive or radiation-sensitive resin composition is an actinic ray-sensitive or radiation-sensitive resin composition including a resin A whose solubility in an alkali developer increases by the action of an acid, a compound B that generates an acid upon irradiation with actinic ray...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MARUMO, Kazuhiro, TANGO, Naohiro
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:An actinic ray-sensitive or radiation-sensitive resin composition is an actinic ray-sensitive or radiation-sensitive resin composition including a resin A whose solubility in an alkali developer increases by the action of an acid, a compound B that generates an acid upon irradiation with actinic rays or radiation, a resin C that has a surface energy of more than 25 mJ/m2 and has at least one of a fluorine atom or a silicon atom and a polarity conversion group, and a resin D that has a surface energy of 25 mJ/m2 or less, in which the content of the resin D is 1.1% by mass or more with respect to the total solid content of the actinic ray-sensitive or radiation-sensitive resin composition.