METHOD FOR IMPARTING WATER REPELLENCY TO SUBSTRATE, SURFACE TREATMENT AGENT, AND METHOD FOR SUPPRESSING COLLAPSE OF ORGANIC PATTERN OR INORGANIC PATTERN IN CLEANING SUBSTRATE SURFACE WITH CLEANING LIQUID

A method for imparting water repellency to a substrate; a surface treatment agent used in the method; and a method for suppressing collapse of an organic or inorganic pattern in cleaning the substrate surface with a cleaning liquid. The method includes exposing a surface of a substrate to a surface...

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Bibliographische Detailangaben
Hauptverfasser:	SEKI, Kenji, NAMIKI, Takumi
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORIGINALS THEREFOR PAINTS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A method for imparting water repellency to a substrate; a surface treatment agent used in the method; and a method for suppressing collapse of an organic or inorganic pattern in cleaning the substrate surface with a cleaning liquid. The method includes exposing a surface of a substrate to a surface treatment agent, the surface treatment agent including a water-repelling agent and a nitrogen-containing heterocyclic compound, the water-repelling agent including an alkoxymonosilane compound having a hydrophobic group bonded to a silicon atom. A surface treatment agent including a water-repelling agent and a nitrogen-containing heterocyclic compound, the water-repelling agent (A) including an alkoxymonosilane compound having a hydrophobic group bonded to a silicon atom.