SUBSTRATE PROCESSING APPARATUS AND METHOD OF OPERATING SUBSTRATE PROCESSING APPARATUS

A substrate processing apparatus, includes: a substrate transfer mechanism configured to advance and retreat a holding body that holds a substrate by symmetrically arranging two link mechanisms each including a driving arm and a driven arm; a processing module; a rotation angle measuring part config...

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Hauptverfasser: SASAKI, Junpei, SAKAUE, Hiromitsu
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A substrate processing apparatus, includes: a substrate transfer mechanism configured to advance and retreat a holding body that holds a substrate by symmetrically arranging two link mechanisms each including a driving arm and a driven arm; a processing module; a rotation angle measuring part configured to measure a rotation angle the driving arms; a holding body detection part configured to detect that a specific portion of the holding body is located at a predetermined position; and a controller configured to execute a step of acquiring a measurement value of the rotation angle of the driving arm, a step of obtaining a moving average of the measurement value of the rotation angle, and a step of obtaining a correction amount of the rotation angle so that a substrate transfer position of the holding body of the substrate transfer mechanism for the processing module becomes a reference position.